Mantis Deposition provides high quality deposition components and systems for the thin-film coating community. Our products are designed for all cutting-edge materials research (MBE, Surface Science, PVD, nanocoatings...) and pre-production coating applications.
TheNanoGen50 source is designed for the deposition ofsize-selected nanoparticles under UHV conditions.
The MGC75 thermal gas cracker is designed as source of atomic hydrogen and oxygen in UHV applications where low operational pressure and minimal contamination is required.
TheNanosys500 system is a dedicated system for thedeposition of nanoparticulate films.
RF ionsources generate a beam of energetic ions forapplications such as ion-beam assisted deposition,sputter deposition and milling.
The MATSseries RF atom sources can be used to grow high-qualityoxides or nitride films using highly reactive, yet lowenergy atomic species.
The CUSP series magnetron sputtering cathodes are designed for high-rate, large area coatings. We offer UHV, HV and internal mount versions for 1" to 3" target.
The EVseries mini e-beam evaporators are designed forhighly-controlled evaporation of materials underultra-clean UHV conditions.
Mantis Deposition offers turn-key depositionsystems with an emphasis on configurationflexibility. Our systems are based around ourown UHV deposition components and extensiveexperience with deposition processes.